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  • Vacuum Infrared Tunnel Furnace

    Designed for atmosphere-sensitive thin films such as perovskites, it combines rapid infrared heating with a high vacuum environment to achieve precise temperature field control, significantly reducing film defects and ensuring high yield and consistency of products, supporting continuous large-scale production.


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    • Substrate size

      Conventional pilot line size

      Cycle time

      90s
      (Customizable)

      Temperature control

      Heating chamber heating time:25S@80℃
      Heating chamber temperature accuracy: ±7℃@80℃
      (The heating time depends on the power of infrared tube used)

    • Chamber sealing performance

      When the pump stops, each chamber holds pressure for one minute, with a pressure increase of less than 10Pa

      Safety

      The whole machine is sealed, with air inlet and exhaust channels

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