Vacuum Infrared Tunnel Furnace

Designed for atmosphere-sensitive thin films such as perovskites, it combines rapid infrared heating with a high vacuum environment to achieve precise temperature field control, significantly reducing film defects and ensuring high yield and consistency of products, supporting continuous large-scale production.

Product Feature

  • Intelligent Process Control

    Integrated intelligent control system enables precise programming and coordinated control of temperature, vacuum level, and transfer cycle time, supporting recipe storage and recall, ensuring high process repeatability.

  • Rapid and Uniform Infrared Heating

    Adopts infrared radiation heating for rapid and uniform temperature rise. Chamber temperature uniformity reaches ±2℃ to ±5℃, ensuring consistent film crystallization quality.

  • High Vacuum Clean Environment

    The core process chamber can operate under high vacuum of <10Pa, effectively isolating water and oxygen, providing an oxidation-free heat treatment environment for sensitive materials such as perovskites.

  • Four-Chamber Continuous Design

    Integrates preheating, infrared heating, constant temperature, and four buffer chambers, supporting continuous production with a 90-second cycle time (customizable), designed for GW-level mass production.

  • High Sealing and Stable Pressure Holding

    Excellent chamber sealing performance, with a pressure rise of <10Pa after 1 minute of pump stoppage, ensuring long-term stability and reliability of the process environment.

  • Safe and Clean Integration

    The entire machine is sealed, with a built-in air inlet and exhaust system, ensuring safe equipment operation and cleanliness requirements for the process area.

Product Model

  • Substrate size

    Conventional pilot line size

    Cycle time

    90s (Customizable)

    Temperature Control

    Heating chamber heating time:25S@80℃

    Heating chamber temperature accuracy: ±7℃@80℃

    (The heating time depends on the power of infrared tube used)

    Chamber sealing performance

    When the pump stops, each chamber holds pressure for one minute, with a pressure increase of less than 10Pa

    Safety

    The whole machine is sealed, with air inlet and exhaust channels


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