• Flatbed Coating Machine (GW-level)

    An industrial-grade coating solution specifically designed for GW-level perovskite production lines. It utilizes reliable precision coating technology and fully automated process control to achieve high uniformity and production stability for large-area thin films, thereby ensuring high yield in large-scale mass production.

    • Total Weight

      16T

      Coating Method

      Slot-die Coating

      Substrate size

      1200mmx2400mm (Compatible with smaller sizes)

    • Coating Width

      1200mm (Customizable)

      Coating Uniformity

      ≤5%@(300~600nm)

      Compatible Slurry Viscosity

      1~70cp

    • Cycle time

      75s@60mm/s

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  • Small Flatbed Coating Machine (Laboratory Equipment)

    A small flatbed coating machine for R&D laboratories, designed to meet the research needs of most perovskite solar cell manufacturers. It features a simple structure and user-friendly operation.

    • Energy Consumption

      Low total power: 3KW

      Coating Accuracy

      ±3%@400-500nm (±10 platinum loading)

      Adaptable Substrate Size

      300 x 400mm (Customizable)

    • Speed Fluctuation

      0.5%@30mm/s

      Footprint

      1 m × 1.5 m = 1.5 m²

      Safety

      The whole machine is sealed, with air inlet and exhaust channels

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  • Atmospheric Infrared Drying Oven

    This is an atmospheric infrared drying oven designed and developed for the drying process in laboratory preparation of perovskite thin films. The device requires manual handling of glass sheets and achieves uniform drying by driving the carrier back and forth through a crank-link mechanism.

    • Substrate size

      300mm*400mm
      (Customizable)

      Temperature control

      20℃: 35S
      140℃: 55S

      Temperature Accuracy

      +3℃@120℃
      ±3℃@140℃
      (the heating time depends on the power of infrared tube used)

    • Safety

      The whole machine is sealed, with air inlet and exhaust channels

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  • Vacuum Infrared Tunnel Furnace

    Designed for atmosphere-sensitive thin films such as perovskites, it combines rapid infrared heating with a high vacuum environment to achieve precise temperature field control, significantly reducing film defects and ensuring high yield and consistency of products, supporting continuous large-scale production.


    • Substrate size

      Conventional pilot line size

      Cycle time

      90s
      (Customizable)

      Temperature control

      Heating chamber heating time:25S@80℃
      Heating chamber temperature accuracy: ±7℃@80℃
      (The heating time depends on the power of infrared tube used)

    • Chamber sealing performance

      When the pump stops, each chamber holds pressure for one minute, with a pressure increase of less than 10Pa

      Safety

      The whole machine is sealed, with air inlet and exhaust channels

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  • Butyl Glue Dispensing Machine

    The butyl glue dispensing machine achieves uniform and efficient dispensing of complex glue paths through high-precision dispensing control, fully automatic three-axis movement, and a stable temperature and pressure system, providing reliable airtight and watertight sealing assurance for products such as photovoltaic modules.

    • Maximum Heating Temperature

      200°C

      Dispensing Thickness

      ±0.1mm@0.7mm

      Dispensing Width

      ±0.5mm@10mm

    • Dispensing Speed

      100mm/s

      Glass Size

      635*1245mm

      Temperature Accuracy

      ±3℃@180℃

    • Heating Time

      35 min (RT→200°C)

      Glue Supply Pressure

      16Mpa

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